KHOV XOV TEEB MOM KHIB TSHUAB|Kev kub ceev ceev etching

KHOV XOV TEEB MOM KHIB TSHUAB|Kev kub ceev ceev etching

Cov iav laser Scribing yog kev ua haujlwm siab rau cov khoom siv hluav taws xob, thiab cov duab ua ke, thiab cov duab hluav taws xob, thiab cov kab ntawv no txhawb nqa cov kab hauv ultra zoo<10 μm , ideal for advanced applications such as ITO, silver paste (Ag), graphene, CNT, perovskite solar cells, and more.
Xa kev nug
Hauj lwm lawm

Peb cov khoom ua haujlwm ntawm lub khob Laser Txawj Ua kom muaj kev kub ceev, ultra-nplua (<10μm) laser processing on glass/PET substrates. Ideal for ablation, scribing, and structuring of conductive layers (ITO, Ag, CNT, graphene, etc.) with 99% yield and ±3μm accuracy. Consumable-free, eco-friendly, and fully automated.

 

Saib peb laser Scribing tshuab hauv kev txiav txim: ultra-nplua kev ua yeeb yam iav

 

 

 

Cov ntsiab lus tseem ceeb

 

◎ High efficiency:

Cov iav no laser elbibing tshuab ib qho qhuav, siv cov txheej txheem dawb nrog 4000 mm / s, thiab precise {{5} {5}

◎ Precision & Yooj Yim

Cov ntawv sau lub tshuab no muaj ultra-nplua<10 μm line width processing with support for nanosecond, picosecond, and femtosecond lasers, ±3 μm file stitching accuracy, and a customizable work area of up to 1200×600 mm.

Access Muaj nqis ntau lawm

Cov tshuab laser lizing no tau muab cov dej num muaj 99%, cov neeg ua haujlwm tsis tshua muaj zog, thiab xoom kev ua kom zoo nkauj rau kev tsim khoom.

 

Siv tau cov ntaub ntawv

 

Lub tshuab ua tau ultra - kab zoo - dav Laser itching rau txheej, cov duab thaij, cov duab roj hmab, manide, xov tooj cua, thiab lwm yam, rau ntawm iav lossis zaj duab xis substrates {4 4}} nws tseem tuaj yeem ua raws li kev ncaj qha rau cov kab mob kom tsawg dua 10 microns.

 

Kev Ua Tshwj Xeeb

 

Laser Tau

Fiber laser

Ntsuab Laser

UV laser

Lub paj

1064 nm

532 nm

355 nm

Hwjchim

20 W

10 W

10 W

Mem Tes Dav

Nanosecond, femtosecond, picosecond

Nanosecond, picosecond

Nanosecond, picosecond

Yam tsawg kawg nkaus tsom xam qhov chaw

Tsawg dua los yog sib luag rau 10 μm (nyob ntawm cov khoom thiab laser hom)

Yam tsawg kawg li etch kab dav

Tsawg dua los yog sib luag rau 10 μm (nyob ntawm cov khoom thiab laser hom)

Kev Ceev

Tsawg dua los yog sib npaug rau 4000 mm / s

Ua Ntau Yam

600 × 1200 hli / 600 × 600 hli (tus qauv loj; customerizable raws cov neeg siv khoom)

Qhov ntau tshaj plaws ib ntu

110 hli × 110 hli (qauv kev teeb tsa; xaiv raws li kev thov)

CCD pib ua kom zoo

±3 μm

Lub cev muaj zog rooj teeb tsa Kev Raug

±2 μm

Tsav Lub Cev Muaj Zog Cov Lus Recovitib

±1 μm

Khoom Dimensions

1650 hli L × 1300 hli W × 1670 hli H

Cov Khoom Siv Hluav Taws Xob

1800 kgs

Txhawb cov ntaub ntawv tawm tswv yim

Cov ntaub ntawv Gerber cov qauv, cov ntaub ntawv DTF, cov ntaub ntawv PLT, thiab lwm yam .

 

Siv nyob rau hauv ntau yam kev lag luam .

 

ITO Glass Laser Etching

ITO GAV LASER ESTCHING

Silver Paste Glass Laser Etching

Nyiaj Muab Tshuaj Txhuam Iav Laser etching

Photovoltaic Glass Laser Scribing

Photovoltaic iav laser scribing

Ink Glass Laser Etching

Ink Iav Laser Estching

Gold Plated Glass Laser Etching

Kub Plated Iav Laser Estching

Carbon Powder ITO Conductive Glass Laser Etching

Carbon hmoov / ito conductive iav laser etching